3D Laser Lithography

Model: Photonic Professional (Nanoscribe GMBH – Germany)

Contact Person: Bogdan CĂLIN
Email: bogdan.calin@inflpr.ro
Tel: +4021 457 4550/ ext. 2423

Location: CETAL – Room A008b (Cleanroom ISO7)
Financing project: CETAL 8PM /I 26.11.2008


System Components

  • Laser Source: Laser Toptica - 120 fs, 780 nm, 80 MHz, 120mW;
  • Zeiss inverted microscope;
  • Piezo stage: PIMars - 300x300x300 µm3;
  • Translation stages - 100x100 mm2;
  • Samples holders for: 
    22 x 22 mm2; 25 x 25 mm2; 45-76 x 19-26 mm2; 5" x 5";
    Ø30mm; Ø2"; Ø4"; Ø11-25.4 mm;
  • Microscope Camera: 1.4 Mega Pixels;
  • Microscope Objectives: 100x oil, 100x DiLL, 63x, 20x.


  • 2D lateral resolution:      250 nm;
  • 2D lateral feature size:     90 nm;
  • 3D lateral feature size:     150 nm;
  • Repeatability (coarse stage) < 1.5 µm.


  • 3D printing by Two-Photon Polymerization – TPP;
  • Dip-in Laser Lithography (DiLL);
  • (SU8, Ormocers, IP-L, IP-Dip, etc.);
  • CAD import (STL files);
  • GWL files;
  • Automatic sample positioning;
  • Autofocus;
  • Tilt Correction;
  • PerfectShape® corrections;

3D Laser Lithography is a  Laser Direct-Writing (LDW) technique based on Two-Photon Polymerization (TPP) effect in photoresists.
Starting from a 3D CAD file (STL), by rapid prototyping algorithms fully three dimensional structures can be fabricated with submicrometer resolution.
General Writing Language (GWL) script allows complex 3D designs and full control over the scanning path, laser exposure, automatic positioning and corrections.


  • Micro-optics
  • Photonic crystals and metamaterials
  • Scaffolds for tissue engineering
  • Micro-fluidics
  • 2D masks

[1] Florin Jipa, Marian Zamfirescu, Alin Velea, Mihai Popescu and Razvan Dabu (2013). "Femtosecond Laser Lithography in Organic and Non-Organic Materials", Chapter in: "Updates in Advanced Lithography", Prof. Sumio Hosaka (Ed.), ISBN: 978-953-51-1175-7, InTech, DOI: 10.5772/56579. Available online at Intech.